“ONE-POT catalyst synthesis technology that readily controls the size and structure of catalyst particles by gas phase process” developed by Kim Hee-yeon, principal researcher at the KIER, was selected as one of the top 100 national R&D achievements organized by the Ministry of Science and ICT.

This technology applies chemical vapor deposition technology that was previously applied mainly to thin film coating in semiconductor processes. And it is a ONE-POT catalyst synthesis technology by gas phase process that can freely control the size and distribution of particles. In addition, this catalyst does not easily agglomerate even when applied to high-temperature and high-pressure catalyst processes.